流体机械

2021, v.49;No.585(03) 8-13

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微通道反应器沟槽底面的磨料水射流抛光研究
Research on abrasive waterjet polishing of groove bottom surface in microchannel reactor

管华双,姜晨,李佳音,王璐璐
GUAN Huashuang,JIANG Chen,LI Jiayin,WANG Lulu

摘要(Abstract):

针对燃料电池微通道反应器的沟槽底面抛光技术难题,开展磨料水射流沟槽抛光仿真与试验研究。采用FLUENT软件,对不同工艺参数下沟槽底部剪切力分布进行了数值模拟;根据仿真结果进行316L不锈钢材料的单沟槽抛光工艺试验,检测分析不同抛光参数下单沟槽底面形貌、材料去除率以及表面粗糙度的变化规律;根据单沟槽底面几何精度和表面粗糙度需求,获得最佳的沟槽抛光参数,进行单沟槽抛光验证试验。结果表明:当磨料粒径5 μm,抛光液浓度3%,射流压力0.35 MPa,喷射距离8 mm时沟槽底面抛光效果最佳,抛光后粗糙度Ra达到0.11 μm,沟槽底面轮廓的RMS误差为2.92 μm。试验研究结果为磨料水射流抛光微通道反应器等沟槽类零件提供指导依据。
For the technical problem of groove bottom surface polishing in fuel cell microchannel reactor,the simulation and experimental research of abrasive waterjet groove polishing are carried out.Fluent software is used to simulate the shear force distribution at the bottom of the groove under different process parameters.According to the simulation results,the single groove polishing process experiment of 316L stainless steel is carried out,and the change rules of the bottom surface morphology,material removal rate and surface roughness of the single groove under different polishing parameters are detected and analyzed.According to the geometric accuracy and surface roughness requirements of the single groove bottom surface,the best groove polishing parameters are obtained and the verification test of single groove polishing is carried out.The results show that when the abrasive particle size is 5 μm,the slurry concentration is 3%,the jet pressure is 0.35 MPa,and the spray distance is 8mm,the polishing effect of the groove bottom surface is the best.The roughness Ra after polishing reaches 0.11 μm,and the RMS error of the groove bottom profile is 2.92 μm.The experimental results provide guidance for abrasive waterjet polishing of microchannel reactor and other groove parts.

关键词(KeyWords): 磨料水射流;抛光;数值模拟;工艺参数;不锈钢槽
abrasive waterjet;polishing;numerical simulation;process parameters;stainless steel groove

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基金项目(Foundation): 国家自然科学基金项目(51475310)

作者(Author): 管华双,姜晨,李佳音,王璐璐
GUAN Huashuang,JIANG Chen,LI Jiayin,WANG Lulu

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